爐管系統(Furnace Systems)
1.氧化擴散系統 (Oxidation & Diffusion Furnaces )
2.快速退火系統 (Rapid Temperture Annealing, RTA)
微影系統(Lithograph
沉積系統(Chemical Vapor Deposition Systems)
1.低壓化學氣相沉積系統 (Low Pressure Chemical Vapor Deposition, LPCVD)
2.電漿輔助化學氣相沉積系統A(Plasma-Enhanced Chemical Vapor Deposition, PECVD-A)
3.電漿輔助化學氣相沉積系統B(Plasma-Enhanced Chemical Vapor Deposition, PECVD-B)
4.原子層化學氣相沉積系統(Atomic Layer Chemical Vapor Deposition System, ALD)
5.Picosun原子層化學氣相沉積系統(Atomic Layer Deposition System, Picosun-ALD)
微影系統(Lithography Systems)
1.光罩製作系統(雷射圖形產生系統) (Laser Pattern Generator, DWL-200)
2.圖形產生系統(Pattern Generator)
曝光機 (屬貴儀機台之曝光機,請至國科會基礎研究核心設施預約服務管理系統中之”光罩對準曝光機Aligner”預約)
1.R120黃光周邊附屬機台 (Litho Accessories Machine)
2.雙面光罩對準曝光機(A) (Double Side Mask Aligner (A))
3.雙面光罩對準曝光機(B) (Double Side Mask Aligner (B))
蝕刻系統(Dry Etch Systems)
1.導電性材料活性離子蝕刻機:
(1).高密度活性離子蝕刻系統 (High Density Plasma Reactive Ion Etching System, HDP-RIE)
(2).矽深蝕刻系統(Si Deep-RIE)
(3).矽淺蝕刻系統(Shallow Si RIE)
2.介電性材料活性離子蝕刻系統:
(1).介電材料活性離子蝕刻系統 A(Dielectric Materials Reactive Ion Etching System, RIE-400iP-1)
(2).介電材料活性離子蝕刻系統 B(Dielectric Materials Reactive Ion Etching System, RIE 200L)
(3).介電質蝕刻系統 (Dielectric Materials Reactive Ion Etching System, RIE-400iP-2)
蒸鍍系統(Vacuum Deposition Systems)
1.熱蒸鍍系統:
(1).熱阻絲蒸鍍系統 (Thermal Evaporation Coater)
(2).雙電子槍蒸鍍系統 A (Dual E-Gun Evaporation System A)
(3).雙電子槍蒸鍍系統 B (Dual E-Gun Evaporation System B)
2.高真空鍍膜系統:
(1).真空濺鍍系統 A (Sputtering System A)
(2).真空濺鍍系統 B (Sputtering System B)
(3).高真空鍍膜系統 (High Vacuum Deposition System)
3.(電子系設備)電子槍蒸鍍系統 (E-Beam Evaporator System) (鍍金,現金付費)
分析系統(Analysis Systems)
1.聚焦離子束與電子束顯微系統 (Dual beam [focused ion beam & electron beam] System) FIB
2.冷場發射掃描式電子顯微鏡暨能量散佈分析儀器 (SEM SU-8010) (Cold Field Emission Scanning Electron Microscope (Hitachi SU8010) & Energy Dispersive Spectrometer)
3.高解析度場發射掃描電子顯微鏡暨能量散佈分析儀 (SEM S-4700I) (High-Resolution Cold Field Emission Scanning Electron Microscope & Energy Dispersive Spectrometer, SEM, EDS)
4.全光譜反射式膜厚量測儀 (Reflectometer)
5.探針式輪廓儀 (Dektak XT)
6.四點探針 (4-point Probe)
7.橢圓測試儀 (Ellipsometer)