Machine Open Level, Open people, Training times

A級:開放給需要使用之學生,經訓練考核後可自行操作。 
Level A:General user. The general users can operate the equipment themselves after both training and qualifying.
B級:每位教授指派一位學生申請訓練,該教授之其他學生需由接受訓練的學生代為操作,若有教授使用該儀器之學生過多者,可向儀器負責人申請增加接受訓練學生人數。
Level B:Advanced user. Each professor can assign one student to use the equipment for their group. If necessary, more advent users can be assigned with special application by the professor.
C級:由儀器負責人選定教授推薦之學生若干人接受訓練,經考核後可自行操作儀器並得負責委託服務工作。
Level C:Specific user. Some recommended students often training and qualifying can operate the equipment to work and help service for other researchers.
D級:由本實驗室之技術人員接受委託服務,不開放使用。
Level D:Technician. Only the technician can run the equipment for service.

**每個實驗室申請自行操作之人數限制(奈米中心保有隨時變更人數限制的權利)**

開放等級
Open Level
設備中文名稱
Machine (Chinese language)
校內人數限制
Open people
(intramural)
校外人數限制
Open people
(outside the school)
儀器訓練次數
Training times
A濕式工作台
Wet Bench
不限
(without limit)
不限
(without limit)
最少1次
(At least once)
A光罩對準曝光機
(用此機台需同時加考光阻塗佈機、真空烤箱、光學顯微鏡)
Mask Aligner
(Include:Photo Resist Spinner, Vacuum Oven, Optical Microscope)
不限
(without limit)
不限
(without limit)
最少3次
(At least 3 times)
A雙面光罩對準曝光機(用此機台需同時加考光阻塗佈機、真空烤箱、光學顯微鏡)
Double Side Mask Aligner
(Include:Photo Resist Spinner, Vacuum Oven, Optical Microscope)
不限
(without limit)
3人最少3次
(At least 3 times)
A氧化擴散系統
Oxidation & Diffusion Furnaces
不限
(without limit)
3人最少1次
(At least once)
A低壓化學氣相沉積系統
Low Pressure Chemical Vapor Deposition System
不限
(without limit)
3人最少1次
(At least once)
A熱阻絲蒸鍍系統
Thermal Evaporation Coater
不限
(without limit)
3人最少1次
(At least once)
A雙電子槍蒸鍍系統A
Dual E-Gun Evaporation System(A)
不限
(without limit)
3人最少3次
(At least once)
A雙電子槍蒸鍍系統B
Dual E-Gun (B)
不限
(without limit)
3人最少3次
(At least 3 times)
A真空濺鍍系統A
Sputtering System (A)
不限
(without limit)
3人最少2次
(At least 2 times)
A真空濺鍍系統B
Sputtering System (B)
不限
(without limit)
3人最少2次
(At least 2 times)
A高真空鍍膜系統
High Vacuum Deposition System
不限
(without limit)
3人最少3次
(At least 3 times)
A橢圓測試儀
Ellipsometer
不限
(without limit)
3人最少3次
(At least 3 times)
A電漿輔助化學氣相沉積系統A
Plasma-Enhanced Chemical Vapor Deposition, PECVD-A
不限
(without limit)
3人最少1次
(At least once)
A電漿輔助化學氣相沉積系統B
Plasma-Enhanced Chemical Vapor Deposition, PECVD-B
不限
(without limit)
3人最少1次
(At least once)
A複晶矽活性離子蝕刻系統
Poly-Si Reactive Ion Etching System, Poly-Si RI
不限
(without limit)
3人最少3次
(At least 3 times)
A高密度活性離子蝕刻系統
High Density Plasma Reactive Ion Etching System, HDP-RIE
不限
(without limit)
3人最少3次
(At least 3 times)
A多腔體電漿蝕刻系統
Multi-Chamber Plasma Etching System, P5000E
不限
(without limit)
3人最少3次
(At least 3 times)
A冷場發射掃描式電子顯微鏡暨能量散佈分析儀器(SEM SU-8010)
Cold Field Emission Scanning Electron Microscope (Hitachi SU8010) & Energy Dispersive Spectrometer
不限
(without limit)
3人最少3次
(At least 3 times)
A原子層化學氣相沉積系統
Atomic Layer Chemical Vapor Deposition System, ALD
不限
(without limit)
3人最少3次
(At least 3 times)
A原子層化學氣相沉積系統
Atomic Layer Deposition System,Picosun-ALD
不限
(without limit)
3人最少3次
(At least 3 times)
AVeeco 原子層沉積系統(Atomic Layer Deposition System,-ALD)不限
(without limit)
3人最少3次
(At least 3 times)
A全光譜反射式膜厚量測儀
Reflectometer
不限
(without limit)
3人最少1次
(At least once)
A介電薄膜活性離子蝕刻系統 A
Dielectric Materials Reactive Ion Etching System, RIE-400iP
不限
(without limit)
3人最少3次
(At least 3 times)
A介電薄膜活性離子蝕刻系統 B
Dielectric Materials Reactive Ion Etching System, RIE 200L
不限
(without limit)
3人最少3次
(At least 3 times)
A矽深蝕刻系統
Si Deep-RIE
不限
(without limit)
3人最少3次
(At least 3 times)
A高解析度場發射掃描電子顯微鏡暨能量散佈分析儀(SEM S-4700I)
High-Resolution Cold Field Emission Scanning Electron Microscope & Energy Dispersive Spectrometer, SEM, EDS
不限
(without limit)
不開放
(nonopen)
最少3次
(At least 3 times)
A四點探針
4-point Probe
不限
(without limit)
不限
(without limit)
最少1次
(At least 1 times)
A探針式輪廓儀
Dektak XT
不限
(without limit)
不限
(without limit)
最少3次
(At least 3 times)
A快速退火系統
Rapid Temperture Annealing, RTA
2人2人最1少次
(At least once)
C圖形產生系統
Pattern Generator
3人3人最少6次
(At least 6 times)
C聚焦離子束與電子束顯微系統
Dual beam [focused ion beam & electron beam] System, FIB
2人不開放
(nonopen)
最少8次
(At least 8 times)
C光罩複製機
Mask Aligner
不限
(without limit)
不開放
(nonopen)
D雷射光罩製作系統 Ⅱ(DWL-200)
Laser Pattern Generator, DWL-200
不開放
(nonopen)
不開放
(nonopen)